Sell the Photoresist OP-383, FN-11, OP-25.
Offer type: salePublished: 01.04.2015
| Price: | negotiated |
| Company: | Viktoriya |
| Seller: |  Viktoriya Viktoriya |
| Phones: |  0951643659 Show phone |
| Address: | Ukraine, Donets'ka Oblast', Donetsk |
Sell the Photoresist OP-383, FN-11, OP-25.
Modern liquid photoresists provide a resolution of 0.35 to 0.5 microns (the Pentium III and IV). Microelectronics can not develop without improving the physico-chemical parameters of the photoresists. It is the success of the microelectronics market. For this reason, on the development of the photoresist with a resolution of 0.18 micron announced several Western firms. Although known physical mechanism of this photoresist, but its composition is kept in strict confidence.
In addition to electronics liquid photoresists are widely used:
In the manufacture of the original master CD - key and the most expensive process in the production of the CD - ROM drive
In the manufacture of original holographic stamp-matrix for holographic labeling (anti-counterfeiting)
In the manufacture of diffraction gratings
In the manufacture of plates for offset printing (copying layer)
In the manufacture of engraved rolls for printing (printing on the packaging and textile industry)
In the manufacture of photogravure etchings
In the manufacture of holographic methods the master disk, stamped matrix, diffraction gratings previously, as a rule, used imported type photoresist AZ-1350. Currently used in photoresists of the company Shipey S1813 or S1818. However, new domestic photoresists with local film thickness variation of less than 10 nm and filtered at 0.2 microns completely replace the photoresist AZ-1350, S1813 or S1818.
Liquid resists are indispensable in the manufacture of printed circuit boards with a high degree of installation (the resolution of the elements to 10 microns), and in the manufacture of one-sided printed circuit boards. In the latter case, the use of liquid photoresists cheapens the process, that is essential for Amateur radio practice.
Modern liquid photoresists provide a resolution of 0.35 to 0.5 microns (the Pentium III and IV). Microelectronics can not develop without improving the physico-chemical parameters of the photoresists. It is the success of the microelectronics market. For this reason, on the development of the photoresist with a resolution of 0.18 micron announced several Western firms. Although known physical mechanism of this photoresist, but its composition is kept in strict confidence.
In addition to electronics liquid photoresists are widely used:
In the manufacture of the original master CD - key and the most expensive process in the production of the CD - ROM drive
In the manufacture of original holographic stamp-matrix for holographic labeling (anti-counterfeiting)
In the manufacture of diffraction gratings
In the manufacture of plates for offset printing (copying layer)
In the manufacture of engraved rolls for printing (printing on the packaging and textile industry)
In the manufacture of photogravure etchings
In the manufacture of holographic methods the master disk, stamped matrix, diffraction gratings previously, as a rule, used imported type photoresist AZ-1350. Currently used in photoresists of the company Shipey S1813 or S1818. However, new domestic photoresists with local film thickness variation of less than 10 nm and filtered at 0.2 microns completely replace the photoresist AZ-1350, S1813 or S1818.
Liquid resists are indispensable in the manufacture of printed circuit boards with a high degree of installation (the resolution of the elements to 10 microns), and in the manufacture of one-sided printed circuit boards. In the latter case, the use of liquid photoresists cheapens the process, that is essential for Amateur radio practice.
