Cathode-1m, Lip-71p-3, vu-2m, Nnv-6m, Implus-1000 installation vacuum deposition b/a

Company TITAN sells used equipment:

1.) Cathode-IM - install magnetron sputtering used, the year of release - 1989. Brief description: the purpose of obtaining a layered , resistive and dielectric thin films of the five materials in one cycle of pumping; complete condition, healthy;

2.) Lip-71P-3 - automated installation of vacuum deposition used, year of release - 1990. Brief description: the number of substrate size 60x48 mm, processed in a single cycle - 19 PCs; the range of heating temperature of substrates - 100 up to 350 C deg; speed of rotation of the carousel - 10...60 rpm; time training set to work, taking into account the "acceleration" of crianas, no more than 80 min;

3.) WU-2M - installation of vacuum deposition used, the year of issue 1990. Summary: the pressure in the chamber is 6X10-4 PA; the time to reach pressure in the chamber without heating in the operating mode of the diffusion pump and the liquid nitrogen cooling of cryopanel and traps from the beginning of pumping air from camera, no more than 30 min; number of evaporators - 3 (electron-beam, ALI - 2, RC - 1); maximum power ELI - 6 kW; inner diameter camera - 700 mm; maximum weight of the substrates mounted on the armature, not more than 10 kg; the highest heating temperature of optical parts - 320 C ° the frequency of rotation of the armature - 6...60/min;

4.) Implus 1000 - installation of ion-plasma nitriding b/y, year of release - 2006. Overview: a basic vacuum, not more than - 5pa; working pressure - 25...1000 PA; the maximum power of the unit, not more than 35 kW; power power - 25 kW; maximum discharge current is 50 A, the frequency of the output pulses - 0...40 kHz; control range duty cycle - 0,2...1; flow of working gases (nitrogen, methane, argon,hydrogen) with an accuracy of maintaining the set flow rate, not over - 1.2 percent; total flow of gases is not more than 0,136 cubic meters/hour; working the volume of the chamber Ø 800*970 mm; condition: complete;

5.) NNV-6M, analog HHB-6,6И1 - installation of vacuum deposition used, year of release - 1985, complete condition.

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